A recurring theme in IC design is the gap between performance of silicon technology and the achievable design results. Whenever a gap opens, it is eventually closed by a new generation of EDA tools.
LOS GATOS, Calif. — Version 2.0 of the Advanced Library Format (ALF) has beefed-up signal-integrity features to support a complete RTL-to-GDSII design flow for very deep-submicron ICs. ALF 2.0 was ...
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