US-based semiconductor materials manufacturer Rodel announced that it has signed an agreement to market Taiwan-based Eternal Chemical’s copper CMP (chemical mechanical polishing) slurry products via ...

Chipmakers are relying on machine learning for electroplating and wafer cleaning at leading-edge process nodes, augmenting traditional fault detection/classification and statistical process control in ...

Producing high-purity wafers via the CMP process is a critical application and the halting of harmful slurry-DIW ...

NEW TRIPOLI, Pennsylvania — Revenues for chemical mechanical planarization (CMP) equipment will drop for a second year in 2002 falling to $829 million, according to market research firm The ...

Suppliers of chemical mechanical planarization (CMP) slurries may be fierce competitors of Cabot Microelectronics, the company considered to be the sector's number one player, but they agree with the ...

Chemical mechanical polishing (CMP) is a process of global planarization that leverages the synergetic effect of chemical reactions and mechanical abrasion to facilitate wafer polishing. CMP has ...

For decades, semiconductor manufacturers have used chemical-mechanical polishing (CMP) as the primary technique for the smoothing and leveling (planarization) of dielectrics and metal layers. CMP ...